Distance-Based Multivariate Anomaly Detection in Wire Arc Additive Manufacturing

Document type:: Konferenzbeitrag
Author(s):: Reisch, Raven; Hauser, Tobias; Lutz, Benjamin; Pantano, Matteo; Kamps, Tobias; Knoll, Alois
Title:: Distance-Based Multivariate Anomaly Detection in Wire Arc Additive Manufacturing
Pages contribution:: 659-664
Keywords:: Anomaly Detection, Time Series, Multivariate, Additive Manufacturing, Machine Learning
Book / Congress title:: 2020 19th IEEE International Conference on Machine Learning and Applications (ICMLA)
Publisher:: IEEE
Date of publication:: 01.12.2020
Year:: 2020
Print-ISBN:: 9781728184708
Fulltext / DOI:: doi:10.1109/icmla51294.2020.00109
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