MOCVD of TaN Using the All‐Nitrogen‐Coordinated Precursors [Ta(NEtMe)3(N‐tBu)], [Ta(NEtMe)(N‐tBu){C(N‐iPr)2(NEtMe)}2], and [Ta(NMeEt)2(N‐tBu){Me2N‐N(SiMe3)}]
Chemical Vapor Deposition
2007
13
2-3
77-83
Pt0 and Pd0 Olefin Complexes of the Metalloid N‐Heterocyclic Carbene Analogues [EI(ddp)] (ddp=2‐{(2,6‐diisopropylphenyl)amino}‐4‐{(2,6‐diisopropylphenyl)imino}‐2‐pentene; E=Al, Ga): Ligand Substitution, HH and SiH Bond Activation, and Cluster Formation
Chemistry – A European Journal
2007
13
10
2990-3000
Synthesis, Bifunctionalization, and Application of Isocyanurate-Based Periodic Mesoporous Organosilicas
Chemistry of Materials
2007
19
10
2663-2670
Synthesis and characterisation of zirconium–amido guanidinato complex: a potential precursor for ZrO2thin films
Dalton Trans.
2007
17
1671-1676
Selective Growth and MOCVD Loading of Small Single Crystals of MOF-5 at Alumina and Silica Surfaces Modified with Organic Self-Assembled Monolayers
Chemistry of Materials
2007
19
9
2168-2173
Trapping Metal-Organic Framework Nanocrystals: An in-Situ Time-Resolved Light Scattering Study on the Crystal Growth of MOF-5 in Solution
Journal of the American Chemical Society
2007
129
17
5324-5325
Stabilization of Amide-Based Complexes of Niobium and Tantalum Using Malonates as Chelating Ligands: Precursor Chemistry and Thin Film Deposition
Chemistry of Materials
2007
19
25
6077-6087
Deposition of microcrystalline [Cu3(btc)2] and [Zn2(bdc)2(dabco)] at alumina and silica surfaces modified with patterned self assembled organic monolayers: evidence of surface selective and oriented growth
Journal of Materials Chemistry
2007
17
27
2785