User: Guest  Login
Title:

PARAMETERS CONTROLLING THE DEPOSITION OF AMORPHOUS AND MICROCRYSTALLINE SILICON IN SI-H DISCHARGE PLASMAS

Author(s):
VEPREK, S; IQBAL, Z; OSWALD, HR; al., et
Journal title:
JOURNAL DE PHYSIQUE
Year:
1981
Journal volume:
42
Journal issue:
NC4
Pages contribution:
251-255
 BibTeX