RADIATION ENHANCED SUBLIMATION OF BORON CONTAINING CARBON MATERIALS
JOURNAL OF NUCLEAR MATERIALS
1990
176
481-485
POSSIBLE CONTRIBUTION OF SIH2 AND SIH3 IN THE PLASMA-INDUCED DEPOSITION OF AMORPHOUS-SILICON FROM SILANE
APPLIED PHYSICS LETTERS
1990
56
18
1766-1768
THE MECHANISM OF PLASMA-INDUCED DEPOSITION OF AMORPHOUS-SILICON FROM SILANE
PLASMA CHEMISTRY AND PLASMA PROCESSING
1990
10
1
3-26
SURFACE PROCESSES AND RATE-DETERMINING STEPS IN PLASMA-INDUCED CHEMICAL VAPOR-DEPOSITION - TITANIUM NITRIDE, BORON-CARBIDE AND SILICON
SURFACE & COATINGS TECHNOLOGY
1990
43-4
1-3
154-166