Benutzer: Gast  Login
Sortieren nach:
und:
Mehr ...

VEPREK, S;MANNLING, HD;NIEDERHOFER, A;al., et
Degradation of superhard nanocomposites by built-in impurities
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
2004
22
2
L5-L9

Mehr ...

VEPREK, S;MANNLING, HD;JILEK, M;al., et
Avoiding the high-temperature decomposition and softening of (Al1-xTix)N coatings by the formation of stable superhard nc-(Al1-xTix)N/a-Si3N4 nanocomposite
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
2004
366
1
202-205

Mehr ...

VEPREK, S
Superhard nanocomposites: design concept, properties, present and future industrial applications
EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS
2004
28
3
313-317

Mehr ...

VEPREK, S
Reproducibility of deposition and industrial applications of stable superhard nanocomposites
TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA
2004
14
19-24

Mehr ...

PROCHAZKA, J;KARVANKOVA, P;VEPREK-HEIJMAN, MGJ;al., et
Conditions required for achieving superhardness of >= 45 GPa in nc-TiN/a-Si3N4 nanocomposites
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
2004
384
1-2
102-116

Mehr ...

MA, SL;XU, J;JIE, WQ;al., et
Characterization of microstructure and hardness of pcvd deposited Ti1-xAlxN hard coatings
ACTA METALLURGICA SINICA
2004
40
6
669-672

Mehr ...

LI, ZS;FANG, QF;VEPREK, S;al., et
Evaluation of the internal friction and elastic modulus of the superhard films
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
2004
370
1-2
186-190

Mehr ...

KARVANKOVA, P;VEPREK-HEIJMAN, MGJ;ZAWRAH, MF;al., et
Thermal stability of nc-TiN/a-BN/a-TiB2 nanocomposite coatings deposited by plasma chemical vapor deposition
THIN SOLID FILMS
2004
467
1-2
133-139

Mehr ...

JILEK, M;CSELLE, T;HOLUBAR, P;al., et
Development of novel coating technology by vacuum arc with rotating cathodes for industrial production of nc-(Al1-xTix)N/a-Si3N4 superhard nanocomposite coatings for dry, hard machining
PLASMA CHEMISTRY AND PLASMA PROCESSING
2004
24
4
493-510