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- Title:
PARAMETERS CONTROLLING THE DEPOSITION OF AMORPHOUS AND MICROCRYSTALLINE SILICON IN SI-H DISCHARGE PLASMAS
- Author(s):
- VEPREK, S; IQBAL, Z; OSWALD, HR; al., et
- Journal title:
- JOURNAL DE PHYSIQUE
- Year:
- 1981
- Journal volume:
- 42
- Journal issue:
- NC4
- Pages contribution:
- 251-255
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