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Title:

DOMINANT REACTION CHANNELS AND THE MECHANISM OF SILANE DECOMPOSITION IN A H2-SI(S)-SIH4 GLOW-DISCHARGE

Author(s):
ENSSLEN, K; VEPREK, S
Journal title:
PLASMA CHEMISTRY AND PLASMA PROCESSING
Year:
1987
Journal volume:
7
Journal issue:
2
Pages contribution:
139-153
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