- Title:
Role of oxygen impurities in etching of silicon by atomic hydrogen
- Author(s):
- VEPREK, S; WANG, CL; VEPREK-HEIJMAN, MGJ
- Journal title:
- JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
- Year:
- 2008
- Journal volume:
- 26
- Journal issue:
- 3
- Pages contribution:
- 313-320
- BibTeX