Login
- Title:
THE MECHANISM OF PLASMA-INDUCED DEPOSITION OF AMORPHOUS-SILICON FROM SILANE
- Author(s):
- VEPREK, S; HEINTZE, M
- Journal title:
- PLASMA CHEMISTRY AND PLASMA PROCESSING
- Year:
- 1990
- Journal volume:
- 10
- Journal issue:
- 1
- Pages contribution:
- 3-26
BibTeX
BibTeX