SURFACE HYDROGEN CONTENT AND PASSIVATION OF SILICON DEPOSITED BY PLASMA INDUCED CHEMICAL VAPOR-DEPOSITION FROM SILANE AND THE IMPLICATIONS FOR THE REACTION-MECHANISM

Title:: SURFACE HYDROGEN CONTENT AND PASSIVATION OF SILICON DEPOSITED BY PLASMA INDUCED CHEMICAL VAPOR-DEPOSITION FROM SILANE AND THE IMPLICATIONS FOR THE REACTION-MECHANISM
Author(s):: VEPREK, S; SARROTT, FA; RAMBERT, S; al., et
Journal title:: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
Year:: 1989
Journal volume:: 7
Journal issue:: 4
Pages contribution:: 2614-2624
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