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- Title:
SURFACE HYDROGEN CONTENT AND PASSIVATION OF SILICON DEPOSITED BY PLASMA INDUCED CHEMICAL VAPOR-DEPOSITION FROM SILANE AND THE IMPLICATIONS FOR THE REACTION-MECHANISM
- Author(s):
- VEPREK, S; SARROTT, FA; RAMBERT, S; al., et
- Journal title:
- JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
- Year:
- 1989
- Journal volume:
- 7
- Journal issue:
- 4
- Pages contribution:
- 2614-2624
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