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Titel:

SURFACE HYDROGEN CONTENT AND PASSIVATION OF SILICON DEPOSITED BY PLASMA INDUCED CHEMICAL VAPOR-DEPOSITION FROM SILANE AND THE IMPLICATIONS FOR THE REACTION-MECHANISM

Autor(en):
VEPREK, S; SARROTT, FA; RAMBERT, S; al., et
Zeitschriftentitel:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
Jahr:
1989
Band / Volume:
7
Heft / Issue:
4
Seitenangaben Beitrag:
2614-2624
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