SURFACE HYDROGEN CONTENT AND PASSIVATION OF SILICON DEPOSITED BY PLASMA INDUCED CHEMICAL VAPOR-DEPOSITION FROM SILANE AND THE IMPLICATIONS FOR THE REACTION-MECHANISM

Titel:: SURFACE HYDROGEN CONTENT AND PASSIVATION OF SILICON DEPOSITED BY PLASMA INDUCED CHEMICAL VAPOR-DEPOSITION FROM SILANE AND THE IMPLICATIONS FOR THE REACTION-MECHANISM
Autor(en):: VEPREK, S; SARROTT, FA; RAMBERT, S; al., et
Zeitschriftentitel:: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
Jahr:: 1989
Band / Volume:: 7
Heft / Issue:: 4
Seitenangaben Beitrag:: 2614-2624
BibTeX

Vorkommen: