VIETZKE, E;PHILIPPS, V;FLASKAMP, K;al., et
RADIATION ENHANCED SUBLIMATION OF BORON CONTAINING CARBON MATERIALS
JOURNAL OF NUCLEAR MATERIALS
1990
176
481-485

VEPREK, S;VEPREKHEIJMAN, MGJ
POSSIBLE CONTRIBUTION OF SIH2 AND SIH3 IN THE PLASMA-INDUCED DEPOSITION OF AMORPHOUS-SILICON FROM SILANE
APPLIED PHYSICS LETTERS
1990
56
18
1766-1768

VEPREK, S;HEINTZE, M
THE MECHANISM OF PLASMA-INDUCED DEPOSITION OF AMORPHOUS-SILICON FROM SILANE
PLASMA CHEMISTRY AND PLASMA PROCESSING
1990
10
1
3-26

VEPREK, S
SURFACE PROCESSES AND RATE-DETERMINING STEPS IN PLASMA-INDUCED CHEMICAL VAPOR-DEPOSITION - TITANIUM NITRIDE, BORON-CARBIDE AND SILICON
SURFACE & COATINGS TECHNOLOGY
1990
43-4
1-3
154-166