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- Titel:
MECHANISMS AND RATE DETERMINING STEPS IN PLASMA INDUCED HIGH-RATE CVD OF SILICON AND GERMANIUM - SIMILARITIES AND DIFFERENCES
- Autor(en):
- VEPREK, S; VEPREKHEIJMAN, MGJ; AMBACHER, O; al., et
- Zeitschriftentitel:
- JOURNAL DE PHYSIQUE III
- Jahr:
- 1992
- Band / Volume:
- 2
- Heft / Issue:
- 8
- Seitenangaben Beitrag:
- 1431-1438
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