VEPREK, S;PROKOP, J;GLATZ, F;al., et
Organometallic chemical vapor deposition of germanium from a cyclic germylene, 1,3-di-tert-butyl-1,3,2-diazagermolidin-2-ylidine
CHEMISTRY OF MATERIALS
1996
8
4
825-831

VEPREK, S;HAUSSMANN, M;REIPRICH, S;al., et
Novel thermodynamically stable and oxidation resistant superhard coating materials
SURFACE & COATINGS TECHNOLOGY
1996
87-8
1-3
394-401

VEPREK, S;HAUSSMANN, M;REIPRICH, S
Superhard nanocrystalline W2N/amorphous Si3N4 composite materials
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
1996
14
1
46-51

VEPREK, S
Design of novel nanocrystalline composite materials by means of plasma CVD
PURE AND APPLIED CHEMISTRY
1996
68
5
1023-1027

RUHL, G;REHMET, R;KNIZOVA, M;al., et
In situ XPS studies of the deposition of TiNxCy films from tetrakis(dimethylamido)titanium(IV) and bis[N,N'-bis(tert-butyl)ethylenediamido]titanium(IV)
CHEMISTRY OF MATERIALS
1996
8
12
2712-2720

PROKOP, J;MERICA, R;GLATZ, F;al., et
Selective deposition of amorphous germanium on Si with respect to SiO2 by organometallic CVD
JOURNAL OF NON-CRYSTALLINE SOLIDS
1996
200
1026-1028

PATSCHEIDER, J;LI, SZ;VEPREK, S
Plasma-induced deposition of titanium nitride from TiCl4 in a direct current glow discharge: Control of the chlorine content and gas-phase nucleation
PLASMA CHEMISTRY AND PLASMA PROCESSING
1996
16
3
341-363

KUNSTMANN, T;VEPREK, S;SCHMIDBAUR, H;al., et
Chemical vapor deposition of 3C-SiC on Si(100) from methyltrichlorosilane and methyltribromosilane
SILICON CARBIDE AND RELATED MATERIALS 1995
1996
142
213-216