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Titel:

Structure and photoluminescence features of nanocrystalline Si/SiO2 films produced by plasma chemical vapor deposition and post-treatment

Autor(en):
WU, XC; OSSADNIK, C; EGGS, C; al., et
Zeitschriftentitel:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Jahr:
2002
Band / Volume:
20
Heft / Issue:
4
Seitenangaben Beitrag:
1368-1378
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