Login
- Title:
MECHANISMS AND RATE DETERMINING STEPS IN PLASMA INDUCED HIGH-RATE CVD OF SILICON AND GERMANIUM - SIMILARITIES AND DIFFERENCES
- Author(s):
- VEPREK, S; VEPREKHEIJMAN, MGJ; AMBACHER, O; al., et
- Journal title:
- JOURNAL DE PHYSIQUE III
- Year:
- 1992
- Journal volume:
- 2
- Journal issue:
- 8
- Pages contribution:
- 1431-1438
BibTeX