Plasma-induced deposition of titanium nitride from TiCl4 in a direct current glow discharge: Control of the chlorine content and gas-phase nucleation

Titel:: Plasma-induced deposition of titanium nitride from TiCl4 in a direct current glow discharge: Control of the chlorine content and gas-phase nucleation
Autor(en):: PATSCHEIDER, J; LI, SZ; VEPREK, S
Zeitschriftentitel:: PLASMA CHEMISTRY AND PLASMA PROCESSING
Jahr:: 1996
Band / Volume:: 16
Heft / Issue:: 3
Seitenangaben Beitrag:: 341-363
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