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Titel:

Graphenic carbon as etching mask: patterning with laser lithography and KOH etching

Dokumenttyp:
Zeitschriftenaufsatz
Autor(en):
A Furio, M Stelzer, M Jung, H C Neitzert, F Kreupl
Abstract:
The wet anisotropic etching process is generally used in the field of micromachining(MEMS), particularly for commercial products such as accelerometers. Hard masks like oxideor nitride play a key role in the transfer of patterns to the substrate during the lithographyprocess. This work reports on the use of polycrystalline graphenic carbon as an etch mask forwet chemical processing and outlines a simple method to create patterned structures on (100)silicon wafers. Graphenic ca...     »
Zeitschriftentitel:
IOP Journal of Physics: Conference Series
Jahr:
2019
Nachgewiesen in:
Scopus
Reviewed:
ja
Sprache:
en
Volltext / DOI:
doi:10.1088/1742-6596/1226/1/012011
WWW:
https://iopscience.iop.org/article/10.1088/1742-6596/1226/1/012011
TUM Einrichtung:
Hybride Elektronische Systeme
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