MEMORY CELL WITH SILICON-CONTAINING CARBON SWITCHING LAYER AND METHODS FOR FORMING THE SAME
Document type:
Patentanmeldung
Patent application number:
EP2539936 (A2)
Inventor:
KREUPL FRANZ [US]; ZHANG JINGYAN [US]; XU HUIWEN [US]
Assignee:
KREUPL FRANZ [US]; ZHANG JINGYAN [US]; XU HUIWEN [US]
Abstract:
In a first aspect, a method of forming a memory cell is provided that includes (1) forming a metal-insulator-metal (MIM) stack, the MIM stack including (a) a first conductive carbon layer; (b) a low-hydrogen, silicon-containing carbon layer above the first conductive carbon layer; and (c) a second conductive carbon layer above the low-hydrogen, silicon-containing carbon layer; and (2) forming a steering element coupled to the MIM stack. Numerous other aspects are provided.