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Titel:

Forming and Resistive Switching of HfO₂-Based RRAM Devices at Cryogenic Temperature

Dokumenttyp:
Zeitschriftenaufsatz
Autor(en):
Perez-Bosch Quesada, Emilio; Mistroni, Alberto; Jia, Ruolan; Dorai Swamy Reddy, Keerthi; Reichmann, Felix; Castan, Helena; Dueñas, Salvador; Wenger, Christian; Perez, Eduardo
Stichworte:
Cryogenics; Logic gates; Switches; MOSFET; Voltage measurement; Switching circuits; Resistance; Hafnium oxide; Current measurement; Transmission electron microscopy; 1T1R; CMOS; cryogenic temperatures; HfO2; resistive switching; RRAM
Zeitschriftentitel:
IEEE Electron Device Letters
Jahr:
2024
Band / Volume:
45
Heft / Issue:
12
Seitenangaben Beitrag:
2391-2394
Volltext / DOI:
doi:10.1109/LED.2024.3485873
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