Electronic Doping and Enhancement of n‐Channel Polycrystalline OFET Performance through Gate Oxide Modifications with Aminosilanes

Title:: Electronic Doping and Enhancement of n‐Channel Polycrystalline OFET Performance through Gate Oxide Modifications with Aminosilanes
Document type:: Zeitschriftenaufsatz
Author(s):: Shin, Nara; Schellhammer, Karl Sebastian; Lee, Min Ho; Zessin, Jakob; Hambsch, Mike; Salleo, Alberto; Ortmann, Frank; Mannsfeld, Stefan C. B.
Journal title:: Advanced Materials Interfaces
Year:: 2021
Journal volume:: 8
Journal issue:: 16
Pages contribution:: 2100320
Fulltext / DOI:: doi:10.1002/admi.202100320
Publisher:: Wiley
E-ISSN:: 2196-73502196-7350
Date of publication:: 26.07.2021
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