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Original title:
Innovative Nanofabrication Methods and Thin-Film Organic Devices 
Translated title:
nnovative Nanofabrication Methods and Thin-Film Organic Devices 
Year:
2008 
Document type:
Habilitation 
Institution:
Fakultät für Elektrotechnik und Informationstechnik 
Advisor:
Prof. Aldo Di Carlo, Università Tor Vergata, Rom 
Referee:
Prof. Dr. Wolfgang Mathis, Universität Hannover 
Language:
en 
Subject group:
ELT Elektrotechnik 
Keywords:
nanoelectronics, molecular electronics, nanoimprint lithography (NIL), optoelectronic 
Abstract:
Nanoimprint lithography (NIL) is a new technique for lithographic patterning of nanostructures, which has advantages of high resolution, high throughput and low cost. This technique is presenting great opportunities for innovation and discovery in many engineering and scientific areas, such as electronic, optoelectronic and magnetism. The area of organic electronics, requiring low cost and high throughput fabrication steps with high resolution, will particularly benefit from this technology. Our...    »
 
Translated abstract:
Nanoimprint lithography (NIL) is a new technique for lithographic patterning of nanostructures, which has advantages of high resolution, high throughput and low cost. This technique is presenting great opportunities for innovation and discovery in many engineering and scientific areas, such as electronic, optoelectronic and magnetism. The area of organic electronics, requiring low cost and high throughput fabrication steps with high resolution, will particularly benefit from this technology. Our...    »
 
Oral examination:
14.11.2008 
Last change:
13.11.2009