Nanoimprint lithography (NIL) is a new technique for lithographic patterning of nanostructures, which has advantages of high resolution, high throughput and low cost. This technique is presenting great opportunities for innovation and discovery in many engineering and scientific areas, such as electronic, optoelectronic and magnetism. The area of organic electronics, requiring low cost and high throughput fabrication steps with high resolution, will particularly benefit from this technology. Our work focuses both on the development of new techniques and materials for NIL technology as well as on the fabrication of several components for innovative devices and systems for different applications in the area of nano- and molecular electronics.     «

Nanoimprint lithography (NIL) is a new technique for lithographic patterning of nanostructures, which has advantages of high resolution, high throughput and low cost. This technique is presenting great opportunities for innovation and discovery in many engineering and scientific areas, such as electronic, optoelectronic and magnetism. The area of organic electronics, requiring low cost and high throughput fabrication steps with high resolution, will particularly benefit from this technology. Our...     »

Nanoimprint lithography (NIL) is a new technique for lithographic patterning of nanostructures, which has advantages of high resolution, high throughput and low cost. This technique is presenting great opportunities for innovation and discovery in many engineering and scientific areas, such as electronic, optoelectronic and magnetism. The area of organic electronics, requiring low cost and high throughput fabrication steps with high resolution, will particularly benefit from this technology. Our work focuses both on the development of new techniques and materials for NIL technology as well as on the fabrication of several components for innovative devices and systems for different applications in the area of nano- and molecular electronics.     «

Nanoimprint lithography (NIL) is a new technique for lithographic patterning of nanostructures, which has advantages of high resolution, high throughput and low cost. This technique is presenting great opportunities for innovation and discovery in many engineering and scientific areas, such as electronic, optoelectronic and magnetism. The area of organic electronics, requiring low cost and high throughput fabrication steps with high resolution, will particularly benefit from this technology. Our...     »