Copper metallizations have been investigated, the relevant failure mechanisms (electromigration, stressmigration, degradation of the isolation) have comprehensively been assessed in their totality and the methodology for the lifetime assessment based on highly accelerated stress tests has been adapted or newly developed for the new interconnect material. Furthermore, explicit focus has been put on the influence of the interconnect design as well as the manufacturing processes of the metallization on its reliability. This work is the basis for the definition and the assessment of an optimum integrated manufacturing process and the definition of guidelines and recommendations for the design of microelectronic products.
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Copper metallizations have been investigated, the relevant failure mechanisms (electromigration, stressmigration, degradation of the isolation) have comprehensively been assessed in their totality and the methodology for the lifetime assessment based on highly accelerated stress tests has been adapted or newly developed for the new interconnect material. Furthermore, explicit focus has been put on the influence of the interconnect design as well as the manufacturing processes of the metallizatio...
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