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Title:

Graphenic Carbon: A Novel Material to Improve the Reliability of Metal-Silicon Contacts

Document type:
Zeitschriftenaufsatz
Author(s):
Max Stelzer, Moritz Jung, Franz Kreupl
Abstract:
Contact resistance and thermal degradation of metal-silicon contacts are major challenges in nanoscale CMOS as well as in power device applications. Titanium silicide (TiSi) is commonly used to establish low-barrier height contacts to silicon, in state-of-the-art FinFETs or Schottky diodes. But the metal is known to diffuse into the active region under high current stress, as during an electro-static discharge (ESD) event. This work shows with a Schottky diode as test vehicle that a carbon-silic...     »
Journal title:
IEEE Journal of the Electron Devices Society
Year:
2017
Year / month:
2017-07
Covered by:
Scopus
Language:
en
Fulltext / DOI:
doi:10.1109/JEDS.2017.2724841
WWW:
http://ieeexplore.ieee.org/document/7972947/
Publisher:
IEEE
TUM Institution:
Hybride Elektronische Systeme
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