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Titel:

Ultra-thin titanium oxide

Dokumenttyp:
Zeitschriftenaufsatz
Autor(en):
Bareiß, M.; Kälblein, D.; Jirauschek, C.; Exner, A.; Pavlichenko, I.; Lotsch, B.; Zschieschang, U.; Klauk, H.; Scarpa, G.; Fabel, B.; Porod, W.; Lugli, P.
Abstract:
We demonstrate the fabrication of ultra-thin titanium oxide films by plasma-induced surface oxidation. Ellipsometry measurements indicate an oxide thickness of about 2 nm. Electrical characterization was performed on microscale and nanoscale metal-insulator-metal tunneling diodes. Electrical fields up to 22 MV/cm were applied without destroying the titanium oxide films. The current-voltage-characteristic of the diodes are found to be asymmetric with respect to zero bias when employing electrodes...     »
Stichworte:
Gold Electrodes Titanium Metallic thin films Permittivity
Zeitschriftentitel:
Appl. Phys. Lett. 101, 083113 2012-01
Jahr:
2012
Jahr / Monat:
2012-01
Quartal:
1. Quartal
Monat:
Jan
Sprache:
en
Volltext / DOI:
doi:10.1063/1.4745651
WWW:
http://scitation.aip.org/content/aip/journal/apl/101/8/10.1063/1.4745651
Verlag / Institution:
AIP Publishing LLC.
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