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Titel:

Electrical and morphological characterization of transfer-printed Au/Ti/TiOx/p+-Si nano- and microstructures with plasma-grown titanium oxide layers

Dokumenttyp:
Zeitschriftenaufsatz
Autor(en):
Weiler, B.; Nagel, R.; Albes, T.; Haeberle, T.; Gagliardi, A.; Lugli, P.
Abstract:
Highly-ordered, sub-70 nm-MOS-junctions of Au/Ti/TiOx/p+-Si were efficiently and reliably fabricated by nanotransfer-printing (nTP) over large areas and their functionality was investigated with respect to their application as MOS-devices. First, we used a temperature-enhanced nTP process and integrated the plasma-oxidation of a nm-thin titanium film being e-beam evaporated directly on the stamp before the printing step without affecting the p+-Si substrate. Second, morphological investigations...     »
Stichworte:
Plasma materials processing Current density Nanostructures Titanium Gold
Zeitschriftentitel:
J. Appl. Phys. 119, 145106 2016-04
Jahr:
2016
Jahr / Monat:
2016-04
Quartal:
2. Quartal
Monat:
Apr
Sprache:
en
Volltext / DOI:
doi:10.1063/1.4946037
WWW:
http://scitation.aip.org/content/aip/journal/jap/119/14/10.1063/1.4946037
Verlag / Institution:
AIP Publishing LLC
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