Chapter 9. Metal-organic Chemical Vapour Deposition of Refractory Transition Metal Nitrides
Chemical Vapour Deposition
Royal Society of Chemistry
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Synthesis and structure of electron rich ruthenium polyhydride complexes and clusters containing AlCp* and GaCp*
Dalton Trans.
2009
2
322-329
Monomeric malonate precursors for the MOCVD of HfO2and ZrO2thin films
Dalton Trans.
2009
4
654-663
A Cobalt(II) Hexafluoroacetylacetonate Ethylenediamine Complex As a CVD Molecular Source of Cobalt Oxide Nanostructures
Inorganic Chemistry
2008
48
1
82-89
Reactions of cationic transition metal acetonitrile complexes [M(CH3CN)n]m+ with GaCp*: novel gallium complexes of iron, cobalt, copper and silver
Dalton Transactions
2009
8
1372
Pd@MOF-5: limitations of gas-phase infiltration and solution impregnation of [Zn4O(bdc)3] (MOF-5) with metal–organic palladium precursors for loading with Pd nanoparticles
Journal of Materials Chemistry
2009
19
9
1314
The adsorbate structure of ferrocene inside [Al(OH)(bdc)]x(MIL-53): a powder X-ray diffraction study
Dalton Trans.
2009
4
600-602
Novel Gallium Complexes with Malonic Diester Anions as Molecular Precursors for the MOCVD of Ga2O3 Thin Films
European Journal of Inorganic Chemistry
2009
2009
8
1110-1117