The Synthesis of Highly Loaded Cu/Al2O3 and Cu/ZnO/Al2O3 Catalysts by the Two‐Step CVD of CuIIdiethylamino‐2‐propoxide in a Fluidized‐Bed Reactor
Chemical Vapor Deposition
2010
16
1-3
85-92
Growth and Characterization of Ti‐Ta‐O Thin Films on Si Substrates by Liquid Injection MOCVD for High‐k Applications from Modified Titanium and Tantalum Precursors
Chemical Vapor Deposition
2010
16
4-6
157-165
Stearate‐Based Cu Colloids in Methanol Synthesis: Structural Changes Driven by Strong Metal–Support Interactions
ChemCatChem
2010
2
2
214-222
Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2gate stacks
Semiconductor Science and Technology
2010
25
4
045009
Selektive oxidative Abspaltung von Cp* von koordiniertem GaCp*: “nacktes” Ga+ in [GaNi(GaCp*)4]+ und [(μ2‐Ga)nM3(GaCp*)6]n+
Angewandte Chemie
2010
122
10
1922-1925
Growth of Crystalline Gd2O3 Thin Films with a High-Quality Interface on Si(100) by Low-Temperature H2O-Assisted Atomic Layer Deposition
Journal of the American Chemical Society
2009
132
1
36-37
Volatile, Monomeric, and Fluorine‐Free Precursors for the Metal Organic Chemical Vapor Deposition of Zinc Oxide
European Journal of Inorganic Chemistry
2010
2010
9
1366-1372
Group 13 Ligand Supported Heavy‐Metal Complexes: First Structural Evidence for Gallium–Lead and Gallium–Mercury Bonds
Chemistry – A European Journal
2010
16
20
6041-6047
Reduktion eines Metall‐organischen Gerüsts mit einem Organometallkomplex: magnetische Eigenschaften und Struktur der Einschlussverbindung [(η5‐C5H5)2Co]0.5@MIL‐47(V)
Angewandte Chemie
2010
122
35
6348-6351
Organometallic Synthesis of β‐CoAl Nanoparticles and β‐CoAl/Al Nanoparticles and Their Behaviour upon Air Exposure (Eur. J. Inorg. Chem. 11/2010)
European Journal of Inorganic Chemistry
2010
2010
11
1587-1587