MOCVD‐Beladung mesoporöser Silicatmatrizen mit Cu/ZnO: neuartige Trägerkatalysatoren für die Methanolsynthese
Angewandte Chemie
2004
116
21
2899-2903
A Study on the Selective Organometallic Vapor Deposition of Palladium onto Self-assembled Monolayers of 4,4‘-Biphenyldithiol, 4-Biphenylthiol, and 11-Mercaptoundecanol on Polycrystalline Silver
Chemistry of Materials
2004
16
4
621-628
AlCp* als Steuerligand: C‐H‐ und Si‐H‐Bindungsaktivierung am reaktiven Intermediat [Ni(AlCp*)3]
Angewandte Chemie
2004
116
17
2349-2352
Fabrication of Self-Assembled Monolayers Exhibiting a Thiol-Terminated Surface
Langmuir
2004
20
20
8620-8624
Mononuclear precursor for MOCVD of HfO2 thin filmsElectronic supplementary information (ESI) available: TG/DTA, and isothermal studies, RBS and AFM data of HfO2 film. See http://www.rsc.org/suppdata/cc/b4/b405015k/
Chemical Communications
2004
14
1610
Ligand stabilised dialkyl aluminium amides as new precursors for aluminium nitride thin films
Journal of Materials Chemistry
2004
14
21
3210
Transition Metal Chemistry of Low Valent Group 13 Organyls
European Journal of Inorganic Chemistry
2004
2004
21
4161-4176
The reaction of RhCp*(CH3)2(L) (L = pyridine, dmso) with GaCp* and AlCp*: A new type of carbon–carbon bond activation reaction
Dalton Trans.
2004
20
3171-3172
Redox Chemistry of Cu Colloids Probed by Adsorbed CO: An in Situ Attenuated Total Reflection Fourier Transform Infrared Study
Langmuir
2004
20
22
9453-9455
The reaction of the group-13 alkyls ER3 (E=Al, Ga, In; R=CH2t-Bu, CH2 SiMe3) with the platinum-complex [(dcpe)Pt(H)(CH2t-Bu)]
Journal of Organometallic Chemistry
2004
689
24
4611-4623