An easy and cost-effective method to reproducibly fabricate nanogaps over a large
area is introduced. Gold is evaporated on low-aspect-ratio polydimethylsiloxane
(PDMS) stamps at an angle of 60 ° . Afterwards, the stamp is brought into contact with
a silicon/silicon dioxide substrate and subsequently peeled at rates varying from 1 to
3 mm s − 1 , resulting in the fabrication of nanogaps between two gold electrodes. The
fabrication of insulating nanogaps with a width down to 50 nm is demonstrated.
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An easy and cost-effective method to reproducibly fabricate nanogaps over a large
area is introduced. Gold is evaporated on low-aspect-ratio polydimethylsiloxane
(PDMS) stamps at an angle of 60 ° . Afterwards, the stamp is brought into contact with
a silicon/silicon dioxide substrate and subsequently peeled at rates varying from 1 to
3 mm s − 1 , resulting in the fabrication of nanogaps between two gold electrodes. The
fabrication of insulating nanogaps with a width down to 50 nm is demonst...
»