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- Title:
Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2gate stacks
- Document type:
- Zeitschriftenaufsatz
- Author(s):
- Hinz, J; Bauer, A J; Thiede, T; Fischer, R A; Frey, L
- Journal title:
- Semiconductor Science and Technology
- Year:
- 2010
- Journal volume:
- 25
- Journal issue:
- 4
- Pages contribution:
- 045009
- Fulltext / DOI:
- doi:10.1088/0268-1242/25/4/045009
- Publisher:
- IOP Publishing
- E-ISSN:
- 0268-12421361-6641
- Date of publication:
- 23.02.2010
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