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Title:

Self-Terminating Protocol for an Interfacial Complexation Reaction in Vacuo by Metal–Organic Chemical Vapor Deposition

Document type:
Zeitschriftenaufsatz
Author(s):
Papageorgiou, Anthoula C.; Fischer, Sybille; Oh, Seung Cheol; Saglam, Özge; Reichert, Joachim; Wiengarten, Alissa; Seufert, Knud; Vijayaraghavan, Saranyan; Ecija, David; Auwärter, Willi; Allegretti, Francesco; Acres, Robert G.; Prince, Kevin C.; Diller, Katharina; Klappenberger, Florian; Barth, Johannes V.
Journal title:
ACS Nano
Year:
2013
Journal volume:
7
Journal issue:
5
Pages contribution:
4520-4526
Fulltext / DOI:
doi:10.1021/nn401171z
Publisher:
American Chemical Society (ACS)
E-ISSN:
1936-08511936-086X
Date of publication:
03.05.2013
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