In this work, we have investigated the leakage mechanism in high permittivity thin film metal-insulator-metal structures. Employing a novel kinetic Monte Carlo but also a modified drift-diffusion simulator, we analyze the behavior of the leakage current for varying bias and temperature conditions. Once validated, our simulations help us identify the main process responsible for the large reported leaking currents: a multi-step trap assisted tunneling process via oxygen vacancies. Several solutions for reducing the undesired currents are presented and analyzed.
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In this work, we have investigated the leakage mechanism in high permittivity thin film metal-insulator-metal structures. Employing a novel kinetic Monte Carlo but also a modified drift-diffusion simulator, we analyze the behavior of the leakage current for varying bias and temperature conditions. Once validated, our simulations help us identify the main process responsible for the large reported leaking currents: a multi-step trap assisted tunneling process via oxygen vacancies. Several solutio...
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