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Title:

Spatially-Modulated Silicon Interface Energetics Via Hydrogen Plasma-Assisted Atomic Layer Deposition of Ultrathin Alumina

Document type:
Zeitschriftenaufsatz
Author(s):
Henning, Alex ; Bartl, Johannes D. ; Wolz, Lukas ; Christis, Maximilian ; Rauh, Felix ; Bissolo, Michele ; Grünleitner, Theresa ; Eichhorn, Johanna ; Zeller, Patrick ; Amati, Matteo ; Gregoratti, Luca ; Finley, Jonathan J. ; Rieger, Bernhard ; Stutzmann, Martin ; Sharp, Ian D.
Keywords:
Research Article ; Research Articles ; aluminum oxide ; atomic layer deposition ; field-effect passivation ; hydrogen plasma ; silicon surface charge density
Journal title:
Advanced Materials Interfaces
Year:
2022
Journal volume:
10
Journal issue:
6
Fulltext / DOI:
doi:10.1002/admi.202202166
E-ISSN:
2196-7350
Date of publication:
16.12.2022
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