Spatially-Modulated Silicon Interface Energetics Via Hydrogen Plasma-Assisted Atomic Layer Deposition of Ultrathin Alumina
Dokumenttyp:
Zeitschriftenaufsatz
Autor(en):
Henning, Alex ; Bartl, Johannes D. ; Wolz, Lukas ; Christis, Maximilian ; Rauh, Felix ; Bissolo, Michele ; Grünleitner, Theresa ; Eichhorn, Johanna ; Zeller, Patrick ; Amati, Matteo ; Gregoratti, Luca ; Finley, Jonathan J. ; Rieger, Bernhard ; Stutzmann, Martin ; Sharp, Ian D.
Stichworte:
Research Article ; Research Articles ; aluminum oxide ; atomic layer deposition ; field-effect passivation ; hydrogen plasma ; silicon surface charge density
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