Graphenic carbon as etching mask: patterning with laser lithography and KOH etching

Title:: Graphenic carbon as etching mask: patterning with laser lithography and KOH etching
Document type:: Zeitschriftenaufsatz
Author(s):: Furio, A; Stelzer, M; Jung, M; Neitzert, H C; Kreupl, F
Journal title:: Journal of Physics: Conference Series
Year:: 2019
Journal volume:: 1226
Pages contribution:: 012011
Fulltext / DOI:: doi:10.1088/1742-6596/1226/1/012011
Publisher:: IOP Publishing
E-ISSN:: 1742-65881742-6596
Date of publication:: 01.05.2019
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