Fabrication of large-grained thin polycrystalline silicon films on foreign substrates by titanium-assisted metal-induced layer exchange

Antesberger, T.; Wassner, T. A.; Kashani, M.; Scholz, M.; Lechner, R.; Matich, S.; Stutzmann, M.

doi:10.1063/1.4768542

Title:: Fabrication of large-grained thin polycrystalline silicon films on foreign substrates by titanium-assisted metal-induced layer exchange
Author(s):: Antesberger, T.; Wassner, T. A.; Kashani, M.; Scholz, M.; Lechner, R.; Matich, S.; Stutzmann, M.
Journal title:: J. Appl. Phys.
Year:: 2012
Journal volume:: 112
Journal issue:: 12
Pages contribution:: 123509
Fulltext / DOI:: doi:10.1063/1.4768542
Publisher:: American Institute of Physics (AIP)
Date of publication:: 01.01.2012
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