Self-Terminating Protocol for an Interfacial Complexation Reaction in Vacuo by Metal–Organic Chemical Vapor Deposition

Papageorgiou, Anthoula C.; Fischer, Sybille; Oh, Seung Cheol; Sağlam, Özge; Reichert, Joachim; Wiengarten, Alissa; Seufert, Knud; Vijayaraghavan, Saranyan; Écija, David; Auwärter, Willi; Allegretti, Francesco; Acres, Robert G.; Prince, Kevin C.; Diller, Katharina; Klappenberger, Florian; Barth, Johannes V.

doi:10.1021/nn401171z

Titel:: Self-Terminating Protocol for an Interfacial Complexation Reaction in Vacuo by Metal–Organic Chemical Vapor Deposition
Autor(en):: Papageorgiou, Anthoula C.; Fischer, Sybille; Oh, Seung Cheol; Sağlam, Özge; Reichert, Joachim; Wiengarten, Alissa; Seufert, Knud; Vijayaraghavan, Saranyan; Écija, David; Auwärter, Willi; Allegretti, Francesco; Acres, Robert G.; Prince, Kevin C.; Diller, Katharina; Klappenberger, Florian; Barth, Johannes V.
Zeitschriftentitel:: ACS Nano
Jahr:: 2013
Seitenangaben Beitrag:: 4520-4526
Volltext / DOI:: doi:10.1021/nn401171z
Verlag / Institution:: American Chemical Society (ACS)
Publikationsdatum:: 28.05.2013
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