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Title:

Nanomagnetic logic devices fabrication using nanoimprint lithography

Document type:
Konferenzbeitrag
Author(s):
Imtaar, M.Y.; Li, P.; Varga, E.; Csaba, G.; Bernstein, G.H.; Scarpa, G.; Porod, W.; Lugli, P.
Abstract:
We present large scale fabrication of nanomagnetic logic devices using nanoimprint lithography. This is a fast and cost-effective way to fabricate nanomagnetic logic devices. Nanoimprint lithography is used for polymer patterning, followed by e-beam evaporation of Supermalloy and liftoff. Scanning electron microscope, atomic force microscope and magnetic force microscope, measurements have been done to verify the eligibility of this method.
Book / Congress title:
13th IEEE International Conference on Nanotechnology (IEEE-NANO 2013) > 578 - 581
Congress (additional information):
Beijing China, 05-08 Aug 2013
Publisher:
IEEE
Year:
2013
Quarter:
3. Quartal
Year / month:
2013-08
Month:
Aug
Pages:
578-581
Print-ISBN:
978-1-4799-0675-8
Bookseries ISSN:
1944-9399
Language:
en
Fulltext / DOI:
doi:10.1109/NANO.2013.6720988
WWW:
http://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=6720988
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