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- Title:
Nanomagnetic logic devices fabrication using nanoimprint lithography
- Document type:
- Konferenzbeitrag
- Author(s):
- Imtaar, M.Y.; Li, P.; Varga, E.; Csaba, G.; Bernstein, G.H.; Scarpa, G.; Porod, W.; Lugli, P.
- Abstract:
- We present large scale fabrication of nanomagnetic logic devices using nanoimprint lithography. This is a fast and cost-effective way to fabricate nanomagnetic logic devices. Nanoimprint lithography is used for polymer patterning, followed by e-beam evaporation of Supermalloy and liftoff. Scanning electron microscope, atomic force microscope and magnetic force microscope, measurements have been done to verify the eligibility of this method.
- Book / Congress title:
- 13th IEEE International Conference on Nanotechnology (IEEE-NANO 2013) > 578 - 581
- Congress (additional information):
- Beijing China, 05-08 Aug 2013
- Publisher:
- IEEE
- Year:
- 2013
- Quarter:
- 3. Quartal
- Year / month:
- 2013-08
- Month:
- Aug
- Pages:
- 578-581
- Print-ISBN:
- 978-1-4799-0675-8
- Bookseries ISSN:
- 1944-9399
- Language:
- en
- Fulltext / DOI:
- doi:10.1109/NANO.2013.6720988
- WWW:
- http://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=6720988
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