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Author(s):
Schoell, S. J.; Howgate, J.; Hoeb, M.; Auernhammer, M.; Garrido, J. A.; Stutzmann, M.; Brandt, M. S.; Sharp, I. D.
Title:
Electrical passivation and chemical functionalization of SiC surfaces by chlorine termination
Journal title:
Appl. Phys. Lett.
Year:
2011
Journal volume:
98
Journal issue:
18
Pages contribution:
182106
Fulltext / DOI:
doi:10.1063/1.3587767
Publisher:
AIP Publishing
E-ISSN:
0003-6951
Date of publication:
01.01.2011
BibTeX
Occurrences:
mediaTUM Gesamtbestand
Hochschulbibliographie
2011
Integrated Research Centers
Institute for Advanced Study (IAS)
mediaTUM Gesamtbestand
Einrichtungen
Forschungszentren
Institute for Advanced Study (IAS)
Fellows
Alumni
Sharp, Ian D.
mediaTUM Gesamtbestand
Einrichtungen
Forschungszentren
Institute for Advanced Study (IAS)
Research Areas
Research Area: Surface, Interface, Nano- and Quantum Science
Alumni Focus Group
Focus Group: Functional Nanosystems