Fabrication of large-grained thin polycrystalline silicon films on foreign substrates by titanium-assisted metal-induced layer exchange

Antesberger, T.; Wassner, T. A.; Kashani, M.; Scholz, M.; Lechner, R.; Matich, S.; Stutzmann, M.

doi:10.1063/1.4768542

Titel:: Fabrication of large-grained thin polycrystalline silicon films on foreign substrates by titanium-assisted metal-induced layer exchange
Autor(en):: Antesberger, T.; Wassner, T. A.; Kashani, M.; Scholz, M.; Lechner, R.; Matich, S.; Stutzmann, M.
Zeitschriftentitel:: J. Appl. Phys.
Jahr:: 2012
Band / Volume:: 112
Heft / Issue:: 12
Seitenangaben Beitrag:: 123509
Volltext / DOI:: doi:10.1063/1.4768542
Verlag / Institution:: American Institute of Physics (AIP)
Publikationsdatum:: 01.01.2012
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