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Document type:
Konferenzbeitrag 
Author(s):
Imtaar, M.A.; Scarpa, G.; Lugli, P. 
Title:
Nanomagnetic Logic Devices Fabrication using Nanoimprint Lithography 
Abstract:
We present large scale fabrication of nanomagnetic logic devices using nanoimprint lithography. This is a fast and cost-effective way to fabricate nanomagnetic logic devices. Nanoimprint lithography is used for polymer patterning, followed by e-beam evaporation of Supermalloy and liftoff. Scanning electron microscope, atomic force microscope and magnetic force microscope, measurements have been done to verify the eligibility of this method. 
Book / Congress title:
13th IEEE International Conference on Nanotechnology, Beijing, China, Aug 5-8, 2013 
Congress (additional information):
Beijing, China, Aug 05 - 08, 2013 
Publisher:
IEEE Xplore Digital Library 
Year:
2013 
Quarter:
3. Quartal 
Year / month:
2013-08 
Month:
Aug 
Pages:
578 - 581 
Language:
en