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Dokumenttyp:
Konferenzbeitrag 
Autor(en):
Imtaar, M.A.; Scarpa, G.; Lugli, P. 
Titel:
Nanomagnetic Logic Devices Fabrication using Nanoimprint Lithography 
Abstract:
We present large scale fabrication of nanomagnetic logic devices using nanoimprint lithography. This is a fast and cost-effective way to fabricate nanomagnetic logic devices. Nanoimprint lithography is used for polymer patterning, followed by e-beam evaporation of Supermalloy and liftoff. Scanning electron microscope, atomic force microscope and magnetic force microscope, measurements have been done to verify the eligibility of this method. 
Kongress- / Buchtitel:
13th IEEE International Conference on Nanotechnology, Beijing, China, Aug 5-8, 2013 
Kongress / Zusatzinformationen:
Beijing, China, Aug 05 - 08, 2013 
Verlag / Institution:
IEEE Xplore Digital Library 
Jahr:
2013 
Quartal:
3. Quartal 
Jahr / Monat:
2013-08 
Monat:
Aug 
Seiten:
578 - 581 
Sprache:
en