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- Author(s):
- VEPREK, S
- Title:
- FUNDAMENTALS OF THE PLASMA INDUCED AND ASSISTED CVD - PLASMA PARAMETERS CONTROLLING THE CHEMICAL-EQUILIBRIUM, THE DEPOSITION KINETICS AND THE PROPERTIES OF THE FILMS
- Journal title:
- JOURNAL DE PHYSIQUE
- Year:
- 1989
- Journal volume:
- 50
- Journal issue:
- C-5
- Pages contribution:
- 617-635
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