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mediaTUM GesamtbestandEinrichtungenFakultätenFakultät für ChemieEhemalige EinrichtungenInstitut für Chemie Anorganischer Materialien (Prof. Veprek)1992

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VEPREK, S;VEPREKHEIJMAN, MGJ;AMBACHER, O;al., et
MECHANISMS AND RATE DETERMINING STEPS IN PLASMA INDUCED HIGH-RATE CVD OF SILICON AND GERMANIUM - SIMILARITIES AND DIFFERENCES
JOURNAL DE PHYSIQUE III
1992
2
8
1431-1438

VEPREK, S
LARGE-AREA BORON-CARBIDE PROTECTIVE COATINGS FOR CONTROLLED THERMONUCLEAR RESEARCH PREPARED BY INSITU PLASMA CVD
PLASMA CHEMISTRY AND PLASMA PROCESSING
1992
12
3
219-235

PATSCHEIDER, J;VEPREK, S
PLASMA-INDUCED DEPOSITION OF THIN-FILMS OF ALUMINUM-OXIDE
PLASMA CHEMISTRY AND PLASMA PROCESSING
1992
12
2
129-145

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