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- Author(s):
- VEPREK, S; KUNSTMANN, T; VOLM, D; al., et
- Title:
- Relaxation of interfacial stress and improved quality of heteroepitaxial 3C-SiC films on (100)Si deposited by organometallic chemical vapor deposition at 1200 degrees C
- Journal title:
- JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
- Year:
- 1997
- Journal volume:
- 15
- Journal issue:
- 1
- Pages contribution:
- 10-17
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